Tungsten Targets

Chemical Formula: W
Description: Custom Fabrication
Purity: ≥ 99.99 – 99.9999%
Packing:
CAS No: 7440-33-7

Application:

Using PVD thin film deposition technology, SMI Ltd. is able to supply planar and rotary tungsten metal sputtering targets. Products are adapted to meet the specific requirements of clients.

Product:	Content:
Tungsten Rods	99.95% min.
Batch No.	Standard - GB/T4181-1997
Element	Concentration (% wt)
Ni	<0.001
Ca	<0.0005
Ho	<0.002
N	<0.0006
Fe	<0.002
Mg	<0.0005
P	<0.001
Sb	<0.0006
Al	<0.0005
Pb	<0.0001
C	<0.001
Cu	<0.0006
Si	<0.001
Bi	<0.0001
O	<0.003